Vapor deposition furnace

Vapor deposition furnace

Vapor deposition furnace

Brother Furnace CVD/PECVD vapor deposition furnace is a high-tech thin film deposition equipment based on plasma chemical vapor deposition technology. It can provide users with excellent performance and has a wide range of applications in microelectronics, optoelectronics, flat panel display, energy storage and other fields.

Introduction

Brother Furnace CVD/ PECVD vapor deposition furnace is a thin film deposition equipment based on plasma chemical vapor deposition technology, which can deposit thin films on various materials, including metals, semiconductors, insulators, etc. It can be widely used in microelectronics, optoelectronics, flat panel display, energy storage and other fields.

Features

● Maximum temperature: 1200℃ (HRE resistance wire heating).

● Intelligent 50-segment programmable automatic control.

● Over-temperature protection function, automatically cuts off power when the temperature exceeds the allowed set value.

● Safety protection: Automatically cut off power when the furnace body leaks electricity.

● Furnace shell structure, double-layer air-cooling structure; surface temperature is lower than 50℃.

● The furnace adopts high-quality alumina polycrystalline fiber inorganic material formed by vacuum adsorption using Japanese technology, which has excellent thermal insulation performance.

● 304 stainless steel KF quick release sealing flange.

● Heating rate ≦20℃/min.

● Temperature control accuracy ±1℃.

● High film deposition rate: Radio frequency glow technology greatly improves the film deposition rate, with the deposition rate reaching 10Å/S.

● High uniformity over a large area: Advanced multi-point RF feed technology, special gas path distribution and heating technology are used to achieve a film uniformity index of 8%.

● High consistency: Using the advanced design concepts of the semiconductor industry, the deviation between each substrate deposited at one time is less than 2%.

● High process stability: Highly stable equipment ensures the continuity and stability of the process.

● The standard direct-connected vacuum pump has an ultimate vacuum degree of up to 10 Pa .

● Standard three-way mass flow meter .

● Plasma RF power supply: maximum RF power up to 500W, output frequency 13.56MHz±0.005%, input power supply 208-240VAC, single-phase 50/60Hz.

Optional accessories

● The vacuum system can be selected according to customer needs ( the highest vacuum degree can reach 7x10-4Pa, molecular pump vacuum system ).

● Gas mixing system and mass flow meter can be provided to meet the mixing of multiple gases and precise control of flow.

● HD touch screen.

Technical Parameters

product name

CVD chemical vapor deposition system

Product number

BR-CVD/PECVD

slide

With slide, the furnace can be slid to achieve rapid heating or cooling function

Heating zone length

400mm single temperature zone/dual temperature zone

Furnace tube size

Diameter 60x1200mm outer diameter x length

Furnace tube material

High purity quartz tube

Operating temperature

≤1100℃

Temperature Control System

Artificial intelligence PID instrument, automatic temperature control

Temperature control accuracy

±1℃ (with over-temperature and couple-off alarm functions)

Heating rate

Recommended 0~10℃/min

Heating element

High quality resistance wire

Vacuum system

Rated voltage

Single phase 220V 50Hz

Passable gas

Inert gases such as nitrogen and argon

Temperature measuring element

Thermocouple temperature measurement

Shell structure

Double-layer shell structure with air cooling system

vacuum flange

It has an air inlet and a pressure control valve, pneumatic pressure relief valve and air release valve at the other end.

Air supply system

Four-way precision proton flow meter, adjust gas flow through touch screen

Vacuum system

Rotary vane pump, the vacuum degree can reach 1pa in the cold state of the empty furnace. Vacuum gauge: Imported digital display vacuum gauge displays the vacuum degree in real time with high accuracy.

Gas dosing system

The overall pressure range can be controlled -20kpa to 20kpa (relative pressure)

Rated voltage

Single phase 220V 50Hz

RF power supply (PECVD only)

Signal frequency

13.56MHz±0.005%

Power output range

500W

Maximum reflected power

500W

RF output interface

50Ω,N-type,female

Power stability

±0.1%

harmonic components

≤-50dbc

Supply voltage

Single-phase AC (187V-253V) frequency 50/60HZ

Overall machine efficiency

>=70%

Power Factor

>=90%

cooling method

Forced air cooling

model

Furnace tube diameter x heating zone length ( mm )

Furnace tube length (mm)

Power ( kW )

Maximum temperature (℃)

gas control

Vacuum degree (Pa)

BR-CVD-60

Φ 60×400

1200

3

1200

3 way

10Pa/7x10-3

BR-CVD-80

Φ 80×400

1200

4

1200

3 way

10Pa/7x10-3

BR-CVD-100

Φ 80×400

1200

6

1200

3 way

10Pa/7x10-3

model

Furnace tube diameter x heating zone length mm

Power ( kW )

Maximum temperature Maximum temperature (℃)

RF power supply

gas control

Vacuum degree (Pa)

frequency

power

BR-PECVD-60

Φ 60×450

4

1200

13.56MHz±0.005%

300-500W

3 way

10Pa/7x10-3

BR-PECVD-80

Φ 80×450

5

1200

3 way

10Pa/7x10-3

BR-PECVD-100

Φ 100×450

7

1200

3 way

10Pa/7x10-3

send message to us now!

Lorem Ipsum is simply dummy text of the printing and typesetting industry. Lorem Ipsum has been the industry's standard dummy text ever since the 1500s, when an unknown printer took a galley of type and scrambled it to make a type specimen book.